– Sputter or Evaporation
– 45 inch source to substrate for superior uniformity when evaporating
– Accommodates up to 3 sputter sources
– Single 37 inch dome handles 25 x 150mm wafers
– Lift off dome supported by 3 point bearing roller scheme for ease of manual rotation
– Integral source isolation
– UltraSource EB Gun with 6 x 100cc crucible
– Operator access via actuated load lock door
– Operator loads wafers in direct path; no reaching or leaning across dome required
Detail Photos

635/SL Module

635/DL Module

635/RL Module

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