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| CHA Mark 40 with ergonomic door option. Click photo to see a larger version. |
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Combining the best features of CHA Industries' Mark 40 sstem with a broad array of options, the innovative Mark 40 represents a distinct breakthrough in vacuum deposition systems offering efficiency, flexibility and ease of maintenance. The Mark 40 accommodates a wide variety of deposition equipment, including versatile combinations of deposition sources and substrates fixturing to address virtually any application. Secs/Gem and CE compliant.
Specifications:
- Dual Operation, Sputtering and Evaporation
- Moving substrates
- Exceptional Film Uniformity (Fixture Dependent)
- Sputter Up
- Process Stations
- Round Cathodes, RF or DC (Up to 4 Stations)
- Co-deposit
- Bias, RF or DC
- Substrate heating, 400°C, multi-element
- Substrate heating, station
- Electron beam
- Thermal
- Sputter etching
- Ion beam pre-clean/etch
- Plasma texturing/etch
- Power Supply Options
- Electron beam, 6-10-15 kW
- Sputtering, 1-3-5-15-30 KW
- Heater, 6-10-16 kW
- Thermal deposition, 1-5-10 kW
- Process Chamber
- Insitu spectrophotometer
- Drop well source
- Easy access to front and rear door
- Variable source-to-substrate distance
- Variable port locations, observation port(s) and RGA port
- Source isolation
- Automatic wafer loading/unloading
- Process chamber dimensions: 26" x 26"
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- Utilities
- Water Supply, 10 GPM
- Air supply, 85-125 PSIG
- Deposition Fixturing
- Adjustable angle planet, standard
- Vertical drum with pallets, standard
- Rotating disk, optional
- Rotating dome, optional
- Flat planetary, 3 or 4, optional
- Shutter(s), flag
- Pumping Stack
- Dry or oil sealed roughing
- Regeneration options
- Famous right angle pumping/plumbing
- Exceptional pumping performance
- High vacuum valve, vertical seal, 16"
- Foreline and roughing valves, vertical seal, 3"
- Large refrigeration vapor pumping options
- Mechanical pump, minimum CFM
- Molecular sieve trap
- Cold trap LN2, 25L pump trap, optional water pump
- LN2 level control
- Ionization gauge control
- Gas controls
- Pumping Options
- Ultimate Vacuum
- System 10 -9 Torr
- Chamber 10 -8 Torr
- Cyro Coil
- 1,000 L/Sec. pumping speed for water vapor and other condensable gases in the process chamber
- Footprint
- 79.5" W x 64"D x 78.5"H (with ISO source add 21"H)
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