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CHA’s new SOLUTION™ Process Development System is a small-scale vacuum deposition system designed for small lot processing (at universities, R&D labs, etc.).
While compact in size at 48.15"D x 46"W x 78.68"H, the SOLUTION™ system has many of the high-performance features as found in CHA’s large-scale Mark 40 and Mark 50 PVD systems, like a fully water-cooled stainless steel chamber for optimizing process start temperatures. |
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- Comes in a standard 18”D x 18”W x 24”H size with a volume of 4.5 ft3. - PLC control - Can accommodate a large volume electron beam gun or resistance source, or various combinations. - Choice of pumping packages, i.e., diffusion, cryogenic or turbo molecular pumps. For the SOLUTION™, CHA provides a variety of high quality tooling, such as lift-off dome, planetary, variable-angle and others; as well as a wide range of source choices, including swing and resistance. |
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