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| CHA Solution |
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CHA's new SOLUTION™ Process Development System is a high performance, compact 48.15"D x 46"W x 78.68"H vacuum deposition system for small lot processing at universities, R&D labs, etc.
For the Solution, CHA provides a variety of high quality tooling, such as lift-off dome, planetary, variable-angle and others; as well as a wide range of source choices, including swing and resistance.
For more details, download the  Solution PDF (356KB).
Specifications:
- Vacuum Chamber
- Type: Water cooled stainless steel
- Size: 18"D x 18"W x 24"H
- Volume: 4.5 ft3
- Inlet flange: NW 50
- Source distance: 15"
- Tooling Options
- Lift-off dome capacity examples, 3 x 150mm/5 x 125mm/7 x 100mm/10 x 75mm
- Planetary dome capacity examples: 9 x 100mm/12 x 75mm
- Variable angle capacity examples: 3 x 150mm/5 x 125mm/7 x 100mm/9 x 75mm
- Pumping Options
- Diffusion: 1200 liters/sec
- Turbomolecular: 320-600 liters/sec
- Cryo: 1100 liters/sec
- Systems Control Options
- Manual: Autotech sequencer
- PLC: Siemens touch screen
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- Vapor Source Options
- Electron beam gun: 4 x 25cc/4 x 40cc/ 6 x 15cc/ 6 x 25cc
- Resistance source
- Swing source
- Power Requirement Options
- Domestic: 120VAC/60Hz, 208VAC/60Hz
- International: 220VAC/50Hz
- Pumping Options
- Ultimate Vacuum
- System 10 -9 Torr
- Chamber 10 -8 Torr
- Cyro Coil
- 1,000 L/Sec. pumping speed for water vapor and other condensable gases in the process chamber
- Footprint
- 79.5" W x 64"D x 78.5"H (with ISO source add 21"H)
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